Abstract
The position of the Fermi level relative to the valence-band maximum has been determined from accurate measurements of the Si core-level position relative to . As a reference, we use -doped samples with a Ga overlayer and -doped samples with a Cs + O overlayer where is pinned near the valence-band maximum and conduction-band minimum, respectively. We obtain eV for low-step-density cleaved Si(111)-(2×1) and eV for annealed Si(111)-(7×7). Stepped cleavage surfaces are characterized by eV and exhibit larger surface core-level shifts and a shift of the dangling-bond states towards lower binding energy.
- Received 23 June 1983
DOI:https://doi.org/10.1103/PhysRevB.28.7014
©1983 American Physical Society