A hybrid density functional study of lithium in ZnO: Stability, ionization levels, and diffusion

A. Carvalho, A. Alkauskas, Alfredo Pasquarello, A. K. Tagantsev, and N. Setter
Phys. Rev. B 80, 195205 – Published 12 November 2009

Abstract

The properties of interstitial and substitutional Li in wurtzite ZnO are modeled using hybrid density functional calculations. We investigate the impact of the band-gap error on the formation energies of the two defects and their dependence on the Fermi level. It is found that within a local-density approximation, the acceptor level of LiZn is very close to the valence-band top but as the band gap is opened, the acceptor state becomes more localized and the respective level is shifted upward. Taking polaronic effects into account, we place the ionization level of LiZn between Ev+0.60eV and Ev+1.1eV. This deeper level explains the difficulty in realizing p-type ZnO using Li as monodopant. Further, the mobility of the defects was investigated. While interstitial Li is mobile at low temperatures, independent of the stoichiometry, the diffusion of LiZn depends on the concentrations of intrinsic defects. Our calculations show that in O-rich material, where the defect is more stable, the dominant diffusion process corresponds to a dissociative mechanism requiring a substantial activation energy.

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  • Received 7 July 2009

DOI:https://doi.org/10.1103/PhysRevB.80.195205

©2009 American Physical Society

Authors & Affiliations

A. Carvalho1, A. Alkauskas2, Alfredo Pasquarello3,4, A. K. Tagantsev1, and N. Setter1

  • 1Ceramics Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
  • 2Electron Spectrometry and Microscopy Laboratory, Institute of Condensed Matter Physics, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
  • 3Institute of Theoretical Physics, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
  • 4Institut Romand de Recherche Numérique en Physique des Matériaux (IRRMA), CH-1015 Lausanne, Switzerland

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Issue

Vol. 80, Iss. 19 — 15 November 2009

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