Pressure and temperature dependence of interlayer spin diffusion and electrical conductivity in the layered organic conductors κ-(BEDT-TTF)2Cu[N(CN)2]X (X = Cl, Br)

Ágnes Antal, Titusz Fehér, Erzsébet Tátrai-Szekeres, Ferenc Fülöp, Bálint Náfrádi, László Forró, and András Jánossy
Phys. Rev. B 84, 075124 – Published 8 August 2011

Abstract

A high frequency (111.2–420 GHz) electron spin resonance study of the interlayer spin diffusion is presented in the conducting phases of the layered organic compounds, κ-(BEDT-TTF)2Cu[N(CN)2]X (κ-ET2-X), X=Cl or Br. The interlayer spin cross relaxation time Tx and the intrinsic spin relaxation time T2 of single layers are measured as a function of temperature and pressure. Spin diffusion is two dimensional in the high temperature bad-metal phase (i.e., electrons are confined to a single molecular layer for longer than T2). The interlayer electron hopping frequency ν=1/(2Tx) decreases along the bad-metal to Mott insulator crossover and increases along the bad-metal to normal metal (or superconductor) crossover. The density of states (DOS) is determined from a comparison of Tx and the interlayer resistivity. In the bad-metal phase it is four to five times larger than the DOS calculated from the electronic structure neglecting electron correlations. In κ-ET2-X the DOS increases with pressure along the bad-metal to normal metal crossover. Results are compared with predictions of the dynamical mean field theory.

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  • Received 27 February 2011

DOI:https://doi.org/10.1103/PhysRevB.84.075124

©2011 American Physical Society

Authors & Affiliations

Ágnes Antal1, Titusz Fehér1, Erzsébet Tátrai-Szekeres1, Ferenc Fülöp1, Bálint Náfrádi1,2, László Forró2, and András Jánossy1,*

  • 1Budapest University of Technology and Economics, Institute of Physics and Condensed Matter Research Group of the Hungarian Academy of Sciences, P.O. Box 91, H-1521 Budapest, Hungary
  • 2Institute of Physics of Complex Matter, FBS, Swiss Federal Institute of Technology (EPFL), CH-1015 Lausanne, Switzerland

  • *atj@szfki.hu

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Vol. 84, Iss. 7 — 15 August 2011

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