Local Structure of <span class="aps-inline-formula"><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><mrow><msub><mrow><mi>NH</mi></mrow><mrow><mn>2</mn></mrow></msub></mrow></math></span> on <span class="aps-inline-formula"><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><mi>Si</mi><mo>(</mo><mn>100</mn><mo>)</mo><mo>−</mo><mo>(</mo><mn>2</mn><mo>×</mo><mn>1</mn><mo>)</mo></math></span> and its Effect on the Asymmetry of the Si Surface Dimers

N. Franco; J. Avila; M. E. Davila; M. C. Asensio; D. P. Woodruff; O. Schaff; V. Fernandez; K.-M. Schindler; V. Fritzsche; A. M. Bradshaw

doi:10.1103/PhysRevLett.79.673

Local Structure of ${NH}_{2}$ on $Si (100) - (2 \times 1)$ and its Effect on the Asymmetry of the Si Surface Dimers

N. Franco, J. Avila, M. E. Davila, M. C. Asensio, D. P. Woodruff, O. Schaff, V. Fernandez, K.-M. Schindler, V. Fritzsche, and A. M. Bradshaw

Phys. Rev. Lett. 79, 673 – Published 28 July 1997

Abstract

A scanned-energy mode photoelectron diffraction study of the $Si (100) - (2 \times 1)$ surface with adsorbed $NH_{2}$ provides quantitative determination of key structural parameters previously only predicted from theoretical calculations. In particular, the $N$ atoms occupy off-atop sites at a dimerized surface Si atom with N-Si bond lengths of $1.73 \pm 0.08 Å$ and bond angle relative to the surface normal of $21 ° \pm 4 °$ . The adsorption greatly reduces the Si dimer asymmetry relative to that of the clean surface.